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October 27, 2017
Catch multi-patterning errors clearly at advanced nodes
How to address increasingly complex patterning issues and debug them efficiently as design moves toward 12 and 10nm.
Article | Topics:
EDA - DFM
,
- EDA Topics
,
EDA - Verification
| Tags:
10nm
,
12nm
,
14nm
,
20nm
,
double patterning
,
lithography
,
multi-patterning
| Organizations:
Mentor
January 4, 2016
2015 – The year in review
Dr Walden Rhines, chairman and CEO of Mentor Graphics, opens a two-part analysis by looking back at the dominant design and business trends in 2015.
Expert Insight | Topics:
EDA Topics
| Tags:
14nm
,
16nm
,
consolidation
,
emulation
,
FD-SOI
,
finFET
,
wireless
| Organizations:
Mentor Graphics
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